Rapid Thermal Processing of Semiconductors (Microdevices)

rapid Thermal Processing Has Contributed To The Development Of Single Wafer Cluster Processing Tools And Other Innovations In Integrated Circuit Manufacturing Environments. Borisenko And Hesketh Review Theoretical And Experimental Progress In The Field, Discussing A Wide Range Of Materials, Processes, And Conditions. They Thoroughly Cover The Work Of International Investigators In The Field.

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covers A Wide Range Of Materials, Processes, And Conditions With Extensive References To Sources Of More Detail On Specific Aspects Of The Thermal Processing Of Material For Semiconductor Devices That Lasts Only Seconds Rather Than The Ten Minutes To Several Hours Of Conventional Thermal Processing. Based Largely On Borisenko's Theoretical And Experimental Work In Belarussian. The Topics Include Heating By Radiation, The Recrystalization Of Implanted Layers And Impurity Behavior In Silicon Crystals, The Diffusion Synthesis Of Silicides In Thin-film Metal-silicon Structures, Oxidation And Nitridation, And Chemical Vapor Deposition. Annotation C. By Book News, Inc., Portland, Or.