Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology, 7)
Author(s)
Sugawara, M.
Sugawara, M.
This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.
Keywords
Electronics - Semiconductors
Electronics - Semiconductors
| Name in long format: | Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology, 7) |
|---|---|
| ISBN-10: | 019856287X |
| ISBN-13: | 9780198562870 |
| Book pages: | 362 |
| Book language: | en |
| Binding: | Hardcover |
| Publisher: | Oxford University Press |
| Dimensions: | Height: 9.3 Inches, Length: 1 Inches, Weight: 1.63803460666 Pounds, Width: 6.4 Inches |
