Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications (Volume 23) (Thin Films, Volume 23)

Author(s)

Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.

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Name in long format: Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications (Volume 23) (Thin Films, Volume 23)
ISBN-10: 0125330235
ISBN-13: 9780125330237
Book pages: 311
Book language: en
Edition: 1
Binding: Hardcover
Publisher: Academic Press
Dimensions: Height: 9 Inches, Length: 6 Inches, Weight: 1.3889122506 Pounds, Width: 0.75 Inches

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